Photolithography method for fabricating object e.g. integrated circuit, involves subtracting surface energy integration from total energy quantity required for photoengraving process, to find remaining energy quantity

摘要

The method involves integrating surface energy of extreme ultraviolet radiation received by an object across a beam hole of chosen width. The integrated energy is subtracted from total energy quantity required for photoengraving process, to find remaining energy quantity. Number of energy quantum that supplies laser sources is calculated to obtain impulse energy quantity. The sources are selected and controlled. An independent claim is also included for a photolithography device.