首页> 外国专利> Device for controlling saturation of gas filter comprises placing secondary filter in parallel with primary filter so it is representative of primary filter and responds to immediate control

Device for controlling saturation of gas filter comprises placing secondary filter in parallel with primary filter so it is representative of primary filter and responds to immediate control

机译:用于控制气体过滤器的饱和度的装置包括:将次级过滤器与初级过滤器并联放置,以使其代表初级过滤器并响应立即控制

摘要

A primary filter (1) is placed in a primary filtration circuit (C1). A secondary filter (5) is placed in a bypass in a secondary circuit (C2) so the secondary filter is representative of the state of the primary filter and responds to immediate control. Tracer gases are injected (by 3) upstream of the secondary filter and detected downstream, with the detector (6) activating an alarm (7). The injector of tracer gases is fed from a reservoir (4) of tracer gases. A primary ventilator (2) and a secondary ventilator (8) are placed respectively upstream or downstream of the principal and secondary filters. The secondary filter is smaller than the primary filter and is identical to the primary filter with respect to the filtered product, contact time, speed of passage and geometry. The tracer gases injected upstream of the secondary filter are representative of the filtered gases.
机译:初级过滤器(1)放置在初级过滤回路(C1)中。次级滤波器(5)放置在次级电路(C2)的旁路中,因此次级滤波器代表初级滤波器的状态,并对立即控制做出响应。示踪气体在二级过滤器的上游(3个)注入,并在下游被检测到,检测器(6)激活警报(7)。示踪气体的喷射器是从示踪气体的储器(4)进料的。主呼吸机(2)和辅助呼吸机(8)分别位于主过滤器和辅助过滤器的上游或下游。次级过滤器比初级过滤器小,并且在过滤产品,接触时间,通过速度和几何形状方面与初级过滤器相同。在次级过滤器上游注入的示踪气体代表了过滤后的气体。

著录项

  • 公开/公告号FR2861319A1

    专利类型

  • 公开/公告日2005-04-29

    原文格式PDF

  • 申请/专利权人 GIAT INDUSTRIES;

    申请/专利号FR20030012438

  • 发明设计人 RECH MARC;

    申请日2003-10-24

  • 分类号B01D53/30;A62B27/00;B01D53/04;

  • 国家 FR

  • 入库时间 2022-08-21 21:58:23

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