EXPOSURE MASK BLANK, METHOD FOR MANUFACTURING THE SAME, EXPOSURE MASK, METHOD FOR MANUFACTURING COLOR FILTER FOR LIQUID CRYSTAL DISPLAY DEVICE, AND COLOR FILTER FOR THE LIQUID CRYSTAL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To devise a process of simplifying the manufacturing process of a color filter for a liquid crystal display device, the filter having a columnar spacer and an overcoat layer, and to devise an exposure mask to be used for the process, and to provide a method for manufacturing the color filter for a liquid crystal display device aimed at cost reduction in manufacturing.;SOLUTION: An exposure mask blank is provided for forming together a columnar spacer and an overcoat layer of the color filter for a liquid crystal display device, and the blank has a semi-transparent film having a function of controlling transmittance for UV rays, and a light-shielding film having shielding effect with respect to UV rays, on a glass substrate. The transmittance of the semi-transparent film for UV rays is 5% or lower at 300 nm wavelength and 45% or higher at 380 nm wavelength. The semi-transparent film consists of an ITO film, comprising a compound film of indium oxide and tin oxide containing 10% or lower tin oxide by the ratio of number of atoms.;COPYRIGHT: (C)2006,JPO&NCIPI