REFLECTIVE/REFRACTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE HAVING REFLECTIVE/REFRACTIVE PROJECTION OPTICAL SYSTEM AND MANUFACTURING METHOD OF DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a reflective/refractive projection optical system capable of stably realizing an excellent image forming performance by shortening a distance (object-image distance) between a first object (reticle) and a second object (wafer), and also to provide an exposure device having the reflective/refractive projection optical system, and a manufacturing method of device using the exposure device.;SOLUTION: The reflective/refractive projection optical system, in which intermediate images of the first object are formed plural times and are formed on the second object, has at least a concave mirror and at least two deflective reflection members, and has not an optical element having refractive power in an optical path between the two deflective refractive members.;COPYRIGHT: (C)2006,JPO&NCIPI