RESIST SHAPE PATTERN, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING MASTER INFORMATION CARRIER, METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM, METHOD FOR MANUFACTURING MAGNETIC RECORDING AND REPRODUCING APPARATUS, AND MAGNETIC RECORDING AND REPRODUCING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern, by which a fine pattern is more stably formed by using a mask aligner and a master information carrier corresponding to a magnetic recording medium in different sizes is manufactured without changing the size of a substrate.;SOLUTION: The method comprises steps of: forming a resist film 2 on the surface of a substrate 1; forming a first projection 252, a second projection 253 and a deaeration recess 251 on the surface of the resist film 2 by exposing and developing at least a part of the resist film 2; tightly adhering a photomask 31 to the surface of the resist film 2 by vacuum sucking through the deaeration recess 251 while the photomask 31 is stacked on the resist film 2; exposing the first projection 252 and a part of the second projection 253 formed on the surface of the resist film 2 into a required pattern; and developing the resist film 2.;COPYRIGHT: (C)2006,JPO&NCIPI