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TETRAGONAL MgSiO3 CRYSTAL, ITS PRODUCING METHOD AND PIEZOELECTRIC ELEMENT

机译:四方晶系MgSiO3晶体及其制备方法和压电元件

摘要

PROBLEM TO BE SOLVED: To provide a new tetragonal MgSiO3 crystal which is free from lead, exhibits excellent piezoelectric characteristics and has especially biocompatibility; a method for producing the same; and a piezoelectric element which is free from lead and has biocompatibility.;SOLUTION: A thin film of the tetragonal MgSiO3 crystal is formed on a crystalline substrate (a silicon single crystal substrate or a substrate obtained by forming a buffer layer on the substrate) by the epitaxial growth of Mg and Si in an oxygen atmosphere using a PVD method (helicon wave reactive sputtering method or the like). As the buffer layer, a layer having a lattice constant in a specified range is required for obtaining the tetragonal MgSiO3 crystal. Above all things, a buffer layer obtained by forming a metal or metal oxide thin film (iridium thin film or iridium oxide thin film) is preferable. The thin film of the tetragonal MgSiO3 crystal can be used as a piezoelectric element for a piezoelectric actuator of an electronic device, especially a piezoelectric actuator for a medical instrument.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种新的无铅的四方晶MgSiO 3 晶体,该晶体具有优良的压电特性,尤其是生物相容性。一种生产方法; SOLUTION:在晶体基板(硅单晶基板或通过成型获得的基板)上形成四方MgSiO 3 晶体的薄膜使用PVD方法(螺旋波反应溅射法等)在氧气气氛中通过Mg和Si的外延生长来形成基板上的缓冲层)。作为缓冲层,需要具有规定范围的晶格常数的层以获得四方的MgSiO 3 晶体。最重要的是,优选通过形成金属或金属氧化物薄膜(铱薄膜或氧化铱薄膜)获得的缓冲层。四方晶系MgSiO 3 晶体薄膜可作为电子器件压电致动器,特别是医疗器械压电致动器的压电元件。版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006160566A

    专利类型

  • 公开/公告日2006-06-22

    原文格式PDF

  • 申请/专利权人 SETSUNAN UNIV;

    申请/专利号JP20040355017

  • 申请日2004-12-08

  • 分类号C30B29/34;C23C14/08;H01L41/18;H01L41/24;

  • 国家 JP

  • 入库时间 2022-08-21 21:55:14

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