PROBLEM TO BE SOLVED: To provide an inorganic alignment layer forming apparatus and an inorganic alignment layer forming method by which reduction of quality of an inorganic alignment layer to be formed can be reliably prevented, to provide the inorganic alignment layer obtained by using the inorganic alignment layer forming apparatus and method and having high reliability, to provide a substrate for an electronic device provided with the inorganic alignment layer, to provide a liquid crystal panel and to provide the electronic device.;SOLUTION: The inorganic alignment layer forming apparatus used for manufacturing the inorganic alignment layer by a vapor phase film deposition method using a target for film deposition in a chamber is characterized in that at least a part of an inner wall surface of the chamber is constituted of the same material as the constitution material of the target.;COPYRIGHT: (C)2006,JPO&NCIPI
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