首页> 外国专利> INORGANIC ALIGNMENT LAYER FORMING APPARATUS, INORGANIC ALIGNMENT LAYER FORMING METHOD, INORGANIC ALIGNMENT LAYER, SUBSTRATE FOR ELECTRONIC DEVICE, LIQUID CRYSTAL PANEL, AND ELECTRONIC DEVICE

INORGANIC ALIGNMENT LAYER FORMING APPARATUS, INORGANIC ALIGNMENT LAYER FORMING METHOD, INORGANIC ALIGNMENT LAYER, SUBSTRATE FOR ELECTRONIC DEVICE, LIQUID CRYSTAL PANEL, AND ELECTRONIC DEVICE

机译:无机对准层形成装置,无机对准层形成方法,无机对准层,电子设备用基板,液晶面板和电子设备

摘要

PROBLEM TO BE SOLVED: To provide an inorganic alignment layer forming apparatus and an inorganic alignment layer forming method by which reduction of quality of an inorganic alignment layer to be formed can be reliably prevented, to provide the inorganic alignment layer obtained by using the inorganic alignment layer forming apparatus and method and having high reliability, to provide a substrate for an electronic device provided with the inorganic alignment layer, to provide a liquid crystal panel and to provide the electronic device.;SOLUTION: The inorganic alignment layer forming apparatus used for manufacturing the inorganic alignment layer by a vapor phase film deposition method using a target for film deposition in a chamber is characterized in that at least a part of an inner wall surface of the chamber is constituted of the same material as the constitution material of the target.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种无机取向层形成装置和无机取向层形成方法,通过该装置和无机取向层形成方法,可以可靠地防止要形成的无机取向层的质量降低,从而提供通过使用无机取向获得的无机取向层。层形成设备和方法,具有很高的可靠性,提供具有无机取向层的电子设备用基板,液晶面板和电子设备。解决方案:用于制造的无机取向层形成设备通过使用在腔室中进行膜沉积的靶的气相膜沉积法的无机取向层的特征在于,腔室的内壁表面的至少一部分由与靶的构成材料相同的材料构成。 ;版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006227430A

    专利类型

  • 公开/公告日2006-08-31

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20050043006

  • 发明设计人 OTA HIDENOBU;

    申请日2005-02-18

  • 分类号G02F1/1337;

  • 国家 JP

  • 入库时间 2022-08-21 21:54:51

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