MANUFACTURING METHOD AND MANUFACTURING APPARATUS OF NARROW TRACK PITCH SUBSTRATE, AND NARROW TRACK PITCH SUBSTRATE OBTAINED BY THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method and a manufacturing apparatus of a narrow track pitch substrate for obtaining a narrower track pitch than a conventional one even when using laser beams of a conventional technology and forming a thin groove and a pit of a narrow width stably, and to provide the narrow track pitch substrate obtained by them.;SOLUTION: Using a semiconductor laser as a light source, an inorganic resist (a phase change film etc.) is irradiated with the laser beam to change its state, and the narrow track pitch substrate is obtained by development treatment and etching treatment. In this case, while controlling a laser beam 16 for second recording so as to obtain a width substantially equal to the width of an inter-groove part 9 corresponding to the width of a part 7 whose state is varied by first recording as shown in the figure 1, recording is carried out, and an inter-groove part 19 is formed finally.;COPYRIGHT: (C)2007,JPO&INPIT