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SELECTIVE DEPOSITION OF ZnO NANOSTRUCTURE ON SILICON SUBSTRATE USING NICKEL CATALYST AND EITHER PATTERNED POLYSILICON OR SILICON SURFACE MODIFICATION
SELECTIVE DEPOSITION OF ZnO NANOSTRUCTURE ON SILICON SUBSTRATE USING NICKEL CATALYST AND EITHER PATTERNED POLYSILICON OR SILICON SURFACE MODIFICATION
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机译:镍催化剂和醚化多晶硅或硅表面改性在硅基质上选择性沉积ZnO纳米结构
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摘要
PROBLEM TO BE SOLVED: To provide a method for forming nanostructures that does not require patterning of a metal catalyst.;SOLUTION: Zinc-oxide nanostructures are formed by forming a pattern on a surface of a substrate. A catalyst metal such as nickel is formed on the surface of the substrate. Growth of at least one zinc oxide nanostructure is induced on the catalyst metal substantially over the pattern on the surface of the substrate based on a vapor-liquid-solid technique. In one exemplary embodiment, inducing the growth of at least one zinc-oxide nanostructure induces growth of each zinc-oxide nanostructure substantially over a patterned polysilicon layer. In another exemplary embodiment, when growth of at least one zinc-oxide nanostructure is induced, each zinc-oxide nanostructure grows substantially over an etched silicon substrate layer.;COPYRIGHT: (C)2006,JPO&NCIPI
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