DESIGN PATTERN CORRECTING APPARATUS, DESIGN PATTERN CORRECTING METHOD, DATA CALCULATING APPARATUS FOR SIZE SETTING, DATA CALCULATING METHOD FOR SIZE SETTING, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a design pattern correcting apparatus with a higher process speed compared to a conventional apparatus.;SOLUTION: The design pattern correcting apparatus includes: a conversion data holding unit 20 that holds the data to convert the proportion of repeated patterns included in a design pattern to the design pattern into the size of a process area per one correction process by the optical proximity effect; a proportion calculating unit 22 that calculates the proportion of repeated patterns in a design pattern as the objective design pattern of the process; an area size setting unit 24 that sets the process area size in the objective design pattern based on the proportion of the repeated patterns calculated by the proportion calculating unit 22 and on the data held by the conversion data holding unit 20; and a correcting unit 26 that performs the optical proximity correction on the objective design pattern in the process area size set by the area size setting unit 24.;COPYRIGHT: (C)2006,JPO&NCIPI