PROCESS FOR PHOTOPROTECTING DIBENZOYLMETHANE DERIVATIVE BY USING ARYLALKYL BENZOATE DERIVATIVE AND BIS-RESORCINYL TRIAZINE COMPOUND AND PHOTOPROTECTIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a process for photoprotecting, with respect to UV radiation, a dibenzoylmethane derivative; to provide a cosmetic composition or a dermatological composition having improved stability of a dibenzoylmethane derivative to the UV rays for topical application.;SOLUTION: The cosmetic or dermatological composition containing at least one dibenzoylmethane derivative for improving the stability of the dibenzoylmethane derivative with respect to the UV radiation, uses an arylalkyl benzoate derivative, and a bis-resorcinyl triazine compound. The cosmetic or dermatological composition for topical use comprises (a) at least one dibenzoylmethane derivative-type UV-screening agent, (b) at least one arylalkyl benzoate derivative and (c) at least one bis-resorcinyl triazine compound for the purpose of improving the stability with respect to the UV rays of the dibenzoylmethane derivative.;COPYRIGHT: (C)2006,JPO&NCIPI