首页> 外国专利> ANALYZING METHOD DUE TO MEASUREMENT OF RESONANCE RAMAN SCATTERING

ANALYZING METHOD DUE TO MEASUREMENT OF RESONANCE RAMAN SCATTERING

机译:测量共振拉曼散射的分析方法

摘要

PROBLEM TO BE SOLVED: To practically enable the analysis of a semiconductor by a nanometer scale.;SOLUTION: In this analyzing method due to the measurement of resonance Raman scattering, an ultraviolet laser beam or extremity ultraviolet laser beam with a wavelength of 364 nm or 351 nm is used as a light source and a sample having a band gap of 3.3-5.1 eV is irradiated with the laser beam or the near-field beam originating therefrom. The resonance Raman scattered beam emitted by the interaction of the sample and the near-field beam is condensed by a near-field probe.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:切实可行地以纳米级分析半导体;解决方案:在这种分析方法中,由于测量共振拉曼散射,波长为364 nm的紫外激光束或极端紫外激光束, 351nm被用作光源,并且具有3.3-5.1eV的带隙的样品被来自其的激光束或近场束照射。样品与近场光束相互作用产生的共振拉曼散射光束被近场探头聚光。COPYRIGHT:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006052965A

    专利类型

  • 公开/公告日2006-02-23

    原文格式PDF

  • 申请/专利权人 TORAY RES CENTER:KK;

    申请/专利号JP20040233138

  • 发明设计人 YOSHIKAWA MASANOBU;

    申请日2004-08-10

  • 分类号G01N13/14;G01N21/65;G01N13/10;

  • 国家 JP

  • 入库时间 2022-08-21 21:53:16

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号