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CALIBRATION APPARATUS AND METHOD OF CALIBRATING RADIATION SENSOR IN LITHOGRAPHIC APPARATUS

机译:光刻设备中的校准装置和校准辐射传感器的方法

摘要

PROBLEM TO BE SOLVED: To provide a calibration apparatus and a method of calibrating a radiation sensor in a lithographic apparatus.;SOLUTION: A calibration apparatus 1 is provided for calibrating a radiation sensor RS in a lithographic apparatus. The calibration apparatus includes a window 3 formed of a substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor 6 is located behind the window having an active surface abutting the window for measuring the intensity of the radiation that passes through the window. A second reference sensor 8 is located at a short distance behind the window having an active surface facing the window. The second reference sensor measures the intensity of the radiation that passes through the window, a first contamination layer 12 formed on the window, and a second contamination layer 13 formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining measurements from the first and the second reference sensors.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种校准设备和一种校准光刻设备中的辐射传感器的方法。解决方案:提供一种校准设备1,用于校准光刻设备中的辐射传感器RS。校准设备包括窗口3,该窗口3由基本辐射透明的材料形成,以允许辐射穿过其中到达辐射传感器。第一参考传感器6位于窗口的后面,第一参考传感器6具有与窗口邻接的有效表面,用于测量穿过窗口的辐射强度。第二参考传感器8位于窗户后面的短距离处,该窗户具有面向窗户的有效表面。第二参考传感器测量穿过窗户的辐射的强度,形成在窗户上的第一污染层12和形成在第二参考传感器的有效表面上的第二污染层13。可以通过组合第一参考传感器和第二参考传感器的测量值来校准辐射传感器。版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006032945A

    专利类型

  • 公开/公告日2006-02-02

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS BV;

    申请/专利号JP20050193839

  • 申请日2005-07-01

  • 分类号H01L21/027;G01J1/00;G01J1/02;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 21:52:39

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