首页> 外国专利> Method of manufacturing a substrate with concave portions for microlenses, substrate with concave portions for microlenses, microlens substrate, the counter substrate for a liquid crystal panel, the liquid crystal panel and a projection type display device

Method of manufacturing a substrate with concave portions for microlenses, substrate with concave portions for microlenses, microlens substrate, the counter substrate for a liquid crystal panel, the liquid crystal panel and a projection type display device

机译:具有微透镜用凹部的基板,微透镜用凹部的基板,微透镜基板,液晶面板的对置基板,液晶面板和投影型显示装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for a substrate with a recessed part for a microlens coping with an aspherical lens.;SOLUTION: The substrate with the recessed part for the microlens is manufactured through a process of forming a first mask layer 6 on the surface of a glass substrate 5, a process of forming a first opening 61 on the first mask layer 6, a process of forming a first recessed part 31 on the glass substrate 5 by wet etching, a process of removing the first mask layer 6, a process of forming a second mask layer 63 on the surface of the glass substrate 5, a process of forming a third opening 631 on the second mask layer 63, a process of forming the recessed part on the glass substrate 5 by wet etching, and a process of removing the second mask layer 63.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种具有凹部的基板的制造方法,该凹部的微透镜与非球面透镜对应;解决方案:具有凹部的基板的微透镜通过形成第一掩模层6的工艺来制造。在玻璃基板5的表面上,在第一掩模层6上形成第一开口61的工序,通过湿蚀刻在玻璃基板5上形成第一凹部31的工序,去除第一掩模层的工序参照图6,在玻璃基板5的表面上形成第二掩模层63的工艺,在第二掩模层63上形成第三开口631的工艺,通过湿法蚀刻在玻璃基板5上形成凹陷部分的工艺。 ;以及去除第二掩模层63的过程。版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP3835319B2

    专利类型

  • 公开/公告日2006-10-18

    原文格式PDF

  • 申请/专利权人 セイコーエプソン株式会社;

    申请/专利号JP20020079811

  • 发明设计人 清水 信雄;坪田 真一;

    申请日2002-03-20

  • 分类号G02F1/1335;G02B3;G02B3/02;

  • 国家 JP

  • 入库时间 2022-08-21 21:52:22

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