首页> 外国专利> PLATEMAKING METHOD FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE IMAGED BY THE PLATEMAKING METHOD

PLATEMAKING METHOD FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE IMAGED BY THE PLATEMAKING METHOD

机译:光敏石版印刷板的制版方法及成像方法成像的石版印刷板

摘要

PROBLEM TO BE SOLVED: To provide a platemaking method for a photopolymerizable photosensitive lithographic printing plate having high sensitivity, printing durability and chemical resistance and excellent in suitability to a yellow fluorescent light for a PS plate, and to provide a lithographic printing plate obtained by the platemaking method.;SOLUTION: In the platemaking method for a photosensitive lithographic printing plate, the photosensitive lithographic printing plate whose photopolymerizable photosensitive layer contains at least the following components (a)-(d) is handled under yellow safelight having an illuminance of 100-500 Lx from which wavelengths of ≤450 nm have been cut and then an image is formed; (a) an addition-polymerizable ethylenic double bond-containing compound having a tertiary amino group, (b) a (meth)acryloyl group-containing alkali-soluble resin binder obtained by reacting a vinyl copolymer using (meth)acrylic acid as a constituent monomer with an epoxy compound having a (meth)acryloyl group, (c) a hexaarylbisimidazole compound as a photopolymerization initiator, (d) a compound selected from the merocyanine dyes represented by formula (I).;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种用于光聚合性光敏平版印刷版的制版方法,该方法具有高灵敏度,印刷耐久性和耐化学性,并且对于PS板的黄色荧光的适应性优异,并提供一种通过该方法获得的平版印刷版。解决方案:在用于光敏平版印刷版的制版方法中,其光聚合性光敏层至少包含以下组分(a)-(d)的光敏平版印刷版在黄色安全光下处理,该安全光的照度为100-从500 Lx处切出约450 nm的波长,然后形成图像; (a)具有叔氨基的可加成聚合的含乙烯性双键的化合物,(b)通过使乙烯基共聚物与(甲基)丙烯酸反应而得到的含(甲基)丙烯酰基的碱溶性树脂粘合剂。单体具有(甲基)丙烯酰基的环氧化合物,(c)六芳基双咪唑化合物作为光聚合引发剂,(d)选自式(I)表示的部花菁染料的化合物。版权所有(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2005351947A

    专利类型

  • 公开/公告日2005-12-22

    原文格式PDF

  • 申请/专利权人 KONICA MINOLTA MEDICAL & GRAPHIC INC;

    申请/专利号JP20040169625

  • 发明设计人 TAKAMUKAI YASUHIKO;

    申请日2004-06-08

  • 分类号G03F7/00;C08F8/00;G03F7/027;G03F7/031;

  • 国家 JP

  • 入库时间 2022-08-21 21:52:15

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号