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PLASMA GENERATOR, PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD

机译:等离子体发生器,等离子体处理装置及等离子体处理方法

摘要

PROBLEM TO BE SOLVED: To provide a plasma generator capable of always providing high plasma generation efficiency without depending on the electron density of plasma, and to provide a plasma treatment device and a plasma treatment method.;SOLUTION: This plasma generator is provided with a plasma generation vessel 10 having a space for generating plasma P and a waveguide body 54 constituting at least a part of the wall surface of the plasma generation vessel 10 for introducing microwaves M from the outside of the plasma generation vessel 10 to the inside thereof; and is so structured as to be able to generate plasma P in the plasma generation vessel 10 by the microwaves M introduced through the waveguide body 54. The waveguide body 54 is characterized by having, between the plasma P and itself, a transition region 54T where its effective dielectric constant is generally continuously lowered toward the plasma P.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种能够不依赖于等离子体的电子密度而始终提供高等离子体产生效率的等离子体发生器,并提供等离子体处理装置和等离子体处理方法。等离子体产生容器10,其具有用于产生等离子体P的空间;和波导体54,其构成等离子体产生容器10的壁表面的至少一部分,用于将微波M从等离子体产生容器10的外部引入其内部;波导体54的特征在于,在等离子体P与自身之间具有过渡区域54T,其中,在等离子体P与自身之间具有过渡区域54T。其有效介电常数通常会朝着等离子体P不断降低。;版权所有:(C)2006,JPO&NCIPI

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