The normal temperature chemical evaporation system and the production methodological null reaction chamber utilizes electronic cyclotron resonance of the compound metal membrane which utilizes

摘要

PROBLEM TO BE SOLVED: To provide a system for chemical vapor deposition at ambient temperature using ECR, which can form a vapor deposition film of high quality, having superior bonding strength of a deposited complex metal film to a substrate, and provide a method for depositing metal composite using the same. ;SOLUTION: The system for chemical vapor deposition at ambient temperature using ECR comprises a reaction chamber 10, a mounting part 15 on which a material is mounted, an ECR system 1 for supplying a plasma, an organic material supply system 3 for supplying the organic material or an organometallic compound, a sputtering system 2 for supplying metal ions, an induction voltage supply system 4 for supplying induction voltage for inducing the metal ions and radical ions on a substrate, and a vacuum system 5 for adjusting a vacuum degree in the above reaction chamber.;COPYRIGHT: (C)2003,JPO