The plasma processing system only tool matching the method of troubleshooting

摘要

Topic This invention coherence of the plasma processing chamber in order to keep the result which is done, the assembly where the chamber hardware part is correct only verification offers high speed and accurate method in order fault diagnosis to repair the chamber plasma processing system.Solutions Method of this invention tests the plasma processing system which has possessed the chamber, RF power source, and adjustable network. The RF electrical signal from RF power source is formed to the chamber without igniting the plasma inside the chamber. It received with the chamber, voltage of the RF electrical signal, electric current of the RF electrical signal, and phase of the RF electrical signal are measured, the other parameters which exert influence on chamber factor simultaneously are kept. The value which displays the impedance of the chamber is calculated voltage, on the basis of electric current, and phase. Next, as for value, reference level it is compared in order to decide the defect in the plasma processing system. Reference level defect is not displays the impedance of the chamber.