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LAPPING GUIDE SYSTEM AND METHOD FOR LAPPING MAGNETIC WRITE AND READ HEAD COLUMN
LAPPING GUIDE SYSTEM AND METHOD FOR LAPPING MAGNETIC WRITE AND READ HEAD COLUMN
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机译:搭接磁性写和读头列的搭接指南系统和方法
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摘要
PROBLEM TO BE SOLVED: To control the significant dimensions of a write head in an ABS (air bearing surface) orthogonal direction independently of the following control while controlling the sensor stripe height of a read head in a merged write/read head.;SOLUTION: The resistance RRE of a first electric lapping guide (ELG) 29 near the sensor 23 in the read head is correlated to the resistance RWE of a second ELG 33 and to the width of a first optical lapping guide (OLG) 37 near the neck region 27 of the write head. The first OLG 37 is a triangular feature with one side parallel to the lapping plane and the other two sides converging near the lapping plane. As the lapping progresses, the resistances RRE and RWE increase and the OLG 36 width along the lapping plane increases. Thus, an OLG 37 width and a resistance RWE corresponding to a target neck height or throat height and a resistance RRE corresponding to a target sensor stripe height are determined. The lapping plane is actively tilted to thereby enable write head dimensions to be independently controlled on a per wafer or per row basis.;COPYRIGHT: (C)2006,JPO&NCIPI
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机译:解决的问题:独立于以下控制,在ABS(空气轴承表面)正交方向上控制写头的重要尺寸,同时在合并的写/读头中控制读头的传感器条带高度。在读取头中的传感器23附近的第一电研磨引导件(ELG)29的电阻R RE Sub>与第二ELG 33的电阻R WE Sub>相关,并且与第一光学研磨引导件(OLG)37的宽度靠近写入头的颈部区域27。第一OLG 37是三角形特征,其一侧平行于研磨平面,另一侧在研磨平面附近会聚。随着研磨的进行,电阻R RE Sub>和R WE Sub>增加,并且沿着研磨平面的OLG 36宽度增加。因此,确定了对应于目标颈部高度或喉部高度的OLG 37宽度和电阻R WE Sub>以及对应于目标传感器条带高度的电阻R RE Sub>。研磨平面可以主动倾斜,从而使写入头的尺寸可以在每个晶片或每行的基础上独立控制。;版权所有:(C)2006,JPO&NCIPI
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