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Formation manner and paint item null silicone

机译:形成方式及涂料项目废有机硅

摘要

PROBLEM TO BE SOLVED: To provide a method for forming coating films which is capable of sufficiently exhibiting the effect by optical semiconductors while preventing coloration of the coating films by the optical semiconductors without the need for specifically changing the kinds of the materials included in coating materials and the content ratios of the respective materials from those of the conventional materials.;SOLUTION: The coating films are formed by applying the coating material containing silicone resins, optical semiconductors and solvents on a base material. The solvents are thereafter removed in an atmosphere of humidity 50 to 90% RH. The coating material is then cured. As a result, the activity of the optical semiconductors in the coating films can be enhanced and the effect by the optical semiconductors can be highly exhibited without the need of incorporating a large amount of the optical semiconductors into the coating films.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种形成涂膜的方法,该方法能够充分发挥光半导体的作用,同时防止光半导体使涂膜着色,而无需专门改变涂料中所含材料的种类。解决方案:涂膜是通过将包含有机硅树脂,光学半导体和溶剂的涂料涂在基材上而形成的。然后在湿度为50至90%RH的气氛中除去溶剂。然后将涂料固化。结果,可以提高涂膜中的光半导体的活性,并且可以高度显示出由光半导体产生的效果,而无需将大量的光半导体掺入涂膜中。日本特许厅

著录项

  • 公开/公告号JP3804449B2

    专利类型

  • 公开/公告日2006-08-02

    原文格式PDF

  • 申请/专利权人 松下電工株式会社;

    申请/专利号JP20000393878

  • 发明设计人 柴田 圭史;田丸 博;辻本 光;

    申请日2000-12-25

  • 分类号B05D3/04;

  • 国家 JP

  • 入库时间 2022-08-21 21:50:14

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