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MICROARRAY SUBSTRATE AND MICROARRAY HAVING PATTERNIZED THIN FILM LAYER, AND MANUFACTURING METHOD FOR MICROARRAY SUBSTRATE AND MICROARRAY

机译:具有图案化薄膜层的微阵列基质和微阵列以及微阵列基质和微阵列的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a microarray substrate and a microarray having a patternized thin film layer, and a manufacturing method for the microarray substrate and the microarray.;SOLUTION: In this microarray substrate, the substrate and a thin film layer substance have different refractive indexes each other, and the patternized thin film layer has a thin film layer patternized on the substrate including a spot area having a thickness generating reinforcement interference between the first reflected light of irradiated excitation light reflected from the substrate and the second reflected light thereof reflected from the thin film layer, and a background area having a thickness generating offset interference between the first reflected light of the irradiated excitation light reflected from the substrate and the second reflected light thereof reflected from the thin film layer.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种微阵列基板和具有图案化薄膜层的微阵列,以及该微阵列基板和微阵列的制造方法。解决方案:在该微阵列基板中,基板和薄膜层物质具有不同的性质。图案化的薄膜层具有相互折射的折射率,并且具有在基板上被图案化的薄膜层,该薄膜层具有斑点区域,该斑点区域的厚度在从基板反射的照射的激发光的第一反射光和其反射的第二反射光之间产生增强干涉。薄膜的背景区域和厚度的背景区域在从基板反射的照射激发光的第一反射光和从薄膜层反射的第二反射光之间产生偏移干涉。版权:(C)2006 ,JPO&NCIPI

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