首页> 外国专利> LAYOUT PLAN STUDY SYSTEM FOR TWO OR MORE BUILDINGS

LAYOUT PLAN STUDY SYSTEM FOR TWO OR MORE BUILDINGS

机译:两个或更多建筑物的布局计划研究系统

摘要

PROBLEM TO BE SOLVED: To provide a layout plan study system for two or more buildings for enabling a user to quickly, easily and comprehensively examine/check lighting, flow lines of a person, appearances, height information or the like of not only each building but also all the buildings by utilizing a layout plan diagram wherein the layout of two or more buildings is illustrated.;SOLUTION: The layout plan study system includes: a layout plan diagram wherein at least the layout of each building A-E is illustrated, for example, a whole plan diagram 1; and a building unit 2 arranged on each building A-E in the whole plan and having a block shaped schematic form of the building.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:要解决的问题:提供用于两个或更多建筑物的布局计划研究系统,以使用户能够快速,轻松且全面地检查/检查照明,人员流线,外观,高度信息等,而不仅仅是每个建筑物解决方案:布局计划研究系统包括:布局计划图,其中至少示出了每个建筑物AE的布局,例如: ,整体平面图1; ;建筑物单元2,布置在整个平面图中的每个建筑物A-E上,并具有该建筑物的块状示意图形式。版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006003430A

    专利类型

  • 公开/公告日2006-01-05

    原文格式PDF

  • 申请/专利权人 SEKISUI HOUSE LTD;

    申请/专利号JP20040177207

  • 发明设计人 ISHIKAWA KAZUO;NAKAYAMA HIDEHIKO;

    申请日2004-06-15

  • 分类号G09B25/04;

  • 国家 JP

  • 入库时间 2022-08-21 21:49:53

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号