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The direct current electron beam acceleration system and the electron beam generation means which generate

机译:直流电子束加速系统和产生电子束的装置

摘要

PROBLEM TO BE SOLVED: To obtain a DC electron beam acceleration apparatus which can accelerator a high intensity DC electron beam. ;SOLUTION: The acceleration apparatus is provided with an electron beam generating part 12, a high frequency cavity 13, and the 1st and 2nd electron beam deflecting device 14, 15. The high frequency cavity 13 accelerate the DC electron beam by injecting high frequency electric field. The electron beam deflecting device deflects electron beam. The electron beam generated by the electron beam generating part 12, is guided to pass into the high frequency cavity 13 by advancing direction P (acceleration X). The advancing direction is changed by the 1st electron beam deflecting device 14. The electron beam is guided to pass into the high frequency cavity 13 by reverse direction (advancing direction Q) (acceleration Y). The electron beam is deflected by the 2nd electron beam deflection device 15, to pass outside of the high frequency cavity 13. The electron beam is deflected by the 1st electron beam deflection device 14, and guided to pass again the cavity 13 by advancing direction Q (acceleration Z). The DC electron beam is accelerated to have high energy by repeating the action of acceleration Z.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:获得可以加速高强度直流电子束的直流电子束加速装置。 ;解决方案:加速装置具有电子束产生部分12,高频腔13和第一和第二电子束偏转装置14、15。高频腔13通过注入高频电子来加速DC电子束。领域。电子束偏转装置使电子束偏转。由电子束产生部分12产生的电子束被引导通过前进方向P(加速度X)进入高频腔13。通过第一电子束偏转装置14改变行进方向。电子束被沿相反的方向(行进方向Q)(加速度Y)引导进入高频腔13。电子束被第二电子束偏转装置15偏转,以通过高频腔13的外部。电子束被第一电子束偏转装置14偏转,并在前进方向Q上被引导再次通过腔13。 (加速度Z)。通过重复加速度Z的作用,直流电子束被加速以具有高能量。;版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP3720654B2

    专利类型

  • 公开/公告日2005-11-30

    原文格式PDF

  • 申请/专利权人 三菱電機株式会社;

    申请/专利号JP19990285427

  • 发明设计人 田中 博文;

    申请日1999-10-06

  • 分类号H05H13/10;G21K1/00;G21K5/04;

  • 国家 JP

  • 入库时间 2022-08-21 21:48:52

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