Aromatic sulfonium salt compound novel photoacid generator including the future and photopolymerizable compositions comprising the same, stereolithography methods and stereolithography resin composition

摘要

The following general formula (I) By aromatic sulfonium salt novel compounds represented by the photo-acid generator including the future and using the photopolymerizable composition containing the curing inhibition by oxygen does not occur, the curing accuracy of times, and the irradiation energy sensitive contrast, depth of cure and also is sufficient, it is possible to suppress the generation of benzene, optical and stereolithography resin composition, can be used for broad developing a food packaging ink or photoresist I will provide a stereolithography method.