Extremely shortly the reflected mirror for ultraviolet ray optical system, the pole shortly ultraviolet ray optical system, the pole shortly usage of ultraviolet ray optical system, the pole shortly production method of ultraviolet ray optical system, the pole shortly the ultraviolet ray exposure device, and the pole it is short usage of the ultraviolet ray exposure device

摘要

Low the thin film resistor layer 2 which consists of TaN on 1 the baseplate of the thermal expansion glass make is formed. In order in order to turn on electricity to thin film resistor layer 2, to touch to the both ends, the electrode layer 3 which consists of Al of thickness 100nm is provided. The insulating layer 4 which consists of SiO_{2 of} thickness 300nm with respect to thin film resistor layer 2 is formed. And, on that, the periodic length 6.7nm which becomes the reflector, Mo/Si multilayer optical membrane 5 of lamination several 50 layer opposites is formed. It has severed relations electrically multilayer optical thin film 5 and thin film resistor layer 2 by insulating layer 4. The cut 21 which is width 10 millimicrons in order to obtain the heat generation distribution of desire is provided in thin film resistor layer 2. It becomes possible to obtain the heat generation distribution which almost is identical with the heat generation, with the light absorption at the time of EUV optical lighting by devising the arrangement of cut 21. Because of this, regarding the measurement state of optical quality, the kind of pole where you can obtain the optical quality which is close to actual busy condition shortly it is possible to offer the reflected mirror for ultraviolet ray optical system.