首页> 外国专利> Method of forming a nanogap and method of manufacturing a nano field effect transitor for molecular device and bio-sensor, and molecular device and bio-sensor manufactured using the same

Method of forming a nanogap and method of manufacturing a nano field effect transitor for molecular device and bio-sensor, and molecular device and bio-sensor manufactured using the same

机译:形成纳米间隙的方法和制造用于分子装置和生物传感器的纳米场效应晶体管的方法,以及使用该方法制造的分子装置和生物传感器

摘要

The present invention relates to a method of forming a nanogap, a method of manufacturing a nano field effect transistor for a molecular device or a bio-sensor, and a fabrication thereof, and more particularly, to a method of forming a high reproductive nanogap using a thin layer with a molecular size or a size which is similar to that of a molecule and a nano field effect transistor manufactured by the method of forming the nanogap. The method of forming a nanogap according to the present invention comprises steps of (a) forming sequentially an insulating layer, a first metal layer and a hard mask on a silicon substrate; (b) etching partially the first metal layer using the mask as an etching mask; (c) forming a self-assembled monolayer (SAM) on a side surface of the first metal layer to form a nanogap on the silicon substrate; (d) depositing metal on the entire structure including the mask to form a second metal layer; (e) removing the metal deposited on the hard mask using a lift-off process by etching the mask formed in step (a) and (f) etching the SAM formed in step (c) to form the nanogap.
机译:技术领域本发明涉及形成纳米间隙的方法,制造用于分子装置或生物传感器的纳米场效应晶体管的方法及其制造,更具体地,涉及使用该方法形成高繁殖性纳米间隙的方法。分子大小或与分子大小相似的薄层和通过形成纳米间隙的方法制造的纳米场效应晶体管。根据本发明的形成纳米间隙的方法包括以下步骤:(a)在硅基板上依次形成绝缘层,第一金属层和硬掩模; (b)使用该掩模作为蚀刻掩模对第一金属层进行部分蚀刻。 (c)在第一金属层的侧表面上形成自组装单层(SAM),以在硅衬底上形成纳米间隙; (d)在包括掩模的整个结构上沉积金属以形成第二金属层; (e)通过蚀刻步骤(a)中形成的掩模,并且通过蚀刻步骤(c)中形成的SAM以形成纳米间隙,通过剥离工艺使用剥离工艺去除沉积在硬掩模上的金属。

著录项

  • 公开/公告号US2006154400A1

    专利类型

  • 公开/公告日2006-07-13

    原文格式PDF

  • 申请/专利权人 YANG-KYU CHOI;JU-HYUN KIM;

    申请/专利号US20060328789

  • 发明设计人 YANG-KYU CHOI;JU-HYUN KIM;

    申请日2006-01-10

  • 分类号H01L21;G03C5;

  • 国家 US

  • 入库时间 2022-08-21 21:48:24

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