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Method of designing charged particle beam mask, charged particle beam mask, and charged particle beam transfer method
Method of designing charged particle beam mask, charged particle beam mask, and charged particle beam transfer method
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机译:带电粒子束掩模的设计方法,带电粒子束掩模和带电粒子束传递方法
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摘要
A method of designing a charged particle beam mask, comprises locating a plurality of identical chip patterns on a charged particle beam mask in which a plurality of subfields that can be transferred at a time are provided vertically and horizontally. The chip patterns have an arrangement pitch that is an integer multiple of the subfield.
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