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Methods and systems for determining a presence of macro and micro defects on a specimen
Methods and systems for determining a presence of macro and micro defects on a specimen
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机译:用于确定试样上是否存在宏观和微观缺陷的方法和系统
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摘要
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro and micro defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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