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System for evaluating a design of a mask, exposure system, method for evaluating a design of a mask, method for manufacturing a semiconductor device and mask
System for evaluating a design of a mask, exposure system, method for evaluating a design of a mask, method for manufacturing a semiconductor device and mask
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机译:用于评估掩模的设计的系统,曝光系统,用于评估掩模的设计的方法,用于制造半导体器件的方法和掩模
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摘要
A system for evaluating a design of a mask includes: an inspection data memory storing initial inspection data of an initial wafer fabricated by an initial mask; a design tool designing a modified mask based on the initial inspection data; a group of manufacturing tools forming an initial mask chip region with the initial mask and a modified mask chip region adjacent to the initial mask region with the modified mask; an inspection tool inspecting faults in the initial and modified mask chip regions; and an evaluation tool evaluating an improvement of the design of the modified mask.
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