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Method for increasing the work function of ITO film under an excimer laser exposure treatment
Method for increasing the work function of ITO film under an excimer laser exposure treatment
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机译:在准分子激光曝光处理下提高ITO膜的功函数的方法
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摘要
The present invention relates to a method for increasing the work function of the indium-tin-oxide (ITO) film under an excimer laser exposure treatment. The range of the excimer laser energy is between tens and hundreds mJ/cm2, the frequency range is between zero and one hundred Hz, and exposure time is between five minutes to tens hours. It, therefore, can increase the work function of the indium-tin-oxide (ITO) film.
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机译:本发明涉及在受激准分子激光曝光处理下提高氧化铟锡(ITO)膜的功函数的方法。准分子激光能量的范围在几十和数百mJ / cm 2 Sup>之间,频率范围在零和一百Hz之间,并且曝光时间在五分钟到几十小时之间。因此,可以增加氧化铟锡(ITO)膜的功函数。
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