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Method for increasing the work function of ITO film under an excimer laser exposure treatment

机译:在准分子激光曝光处理下提高ITO膜的功函数的方法

摘要

The present invention relates to a method for increasing the work function of the indium-tin-oxide (ITO) film under an excimer laser exposure treatment. The range of the excimer laser energy is between tens and hundreds mJ/cm2, the frequency range is between zero and one hundred Hz, and exposure time is between five minutes to tens hours. It, therefore, can increase the work function of the indium-tin-oxide (ITO) film.
机译:本发明涉及在受激准分子激光曝光处理下提高氧化铟锡(ITO)膜的功函数的方法。准分子激光能量的范围在几十和数百mJ / cm 2 之间,频率范围在零和一百Hz之间,并且曝光时间在五分钟到几十小时之间。因此,可以增加氧化铟锡(ITO)膜的功函数。

著录项

  • 公开/公告号US2006024450A1

    专利类型

  • 公开/公告日2006-02-02

    原文格式PDF

  • 申请/专利权人 YOW-JON LIN;CHOU-WEI HSU;

    申请/专利号US20050190961

  • 发明设计人 YOW-JON LIN;CHOU-WEI HSU;

    申请日2005-07-28

  • 分类号B05D3;B06B1;

  • 国家 US

  • 入库时间 2022-08-21 21:43:38

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