首页> 外国专利> Semiconductor laser element having end-facet protection layer which includes unoxidized or unnitrided first sublayer formed on end facet and second sublayer produced by oxidizing or nitriding the surface of the first sublayer

Semiconductor laser element having end-facet protection layer which includes unoxidized or unnitrided first sublayer formed on end facet and second sublayer produced by oxidizing or nitriding the surface of the first sublayer

机译:具有端面保护层的半导体激光元件,端面保护层包括形成在端面上的未氧化或未氮化的第一子层和通过氧化或氮化第一子层的表面而产生的第二子层

摘要

A semiconductor laser element includes: a stack of layers having resonator facets; and at least one protection layer formed on at least one of the resonator facets. Each of the at least one protection layer includes at least first, second, and third sublayers. The first sublayer is formed nearest to the stack among the at least first, second, and third sublayers, and made of a material not containing oxygen (or nitrogen) as a constituent element. The second sublayer is made of an oxide (or nitride) produced by oxidizing (or nitriding) a portion of the first sublayer. The third sublayer is formed farthest from the stack among the at least first, second, and third sublayers, and made of an oxide (or nitride). The thickness d2 of the second sublayer and the total thickness d1 of the first and second sublayers satisfy a relationship, 0.1≦d2/d1≦0.9.
机译:一种半导体激光元件,包括:具有谐振器小平面的层的堆叠;和至少一个保护层形成在至少一个谐振器小面上。至少一个保护层中的每个包括至少第一,第二和第三子层。第一子层形成为在至少第一,第二和第三子层中最靠近堆叠体的位置,并且由不含氧(或氮)作为构成元素的材料制成。第二子层由通过氧化(或氮化)第一子层的一部分而产生的氧化物(或氮化物)制成。在至少第一,第二和第三子层中,第三子层形成为距堆叠体最远,并且由氧化物(或氮化物)制成。第二子层的厚度d 2 与第一子层和第二子层的总厚度d 1 满足关系0.1≤d 2 / d 1 ≤0.9。

著录项

  • 公开/公告号US7065117B2

    专利类型

  • 公开/公告日2006-06-20

    原文格式PDF

  • 申请/专利权人 FUSAO YAMANAKA;

    申请/专利号US20020322599

  • 发明设计人 FUSAO YAMANAKA;

    申请日2002-12-19

  • 分类号H01S3/04;H01S5/00;H01L21/00;

  • 国家 US

  • 入库时间 2022-08-21 21:43:03

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