首页> 外国专利> Sensing device and method for measuring emission time delay during irradiation of targeted samples utilizing variable phase tracking

Sensing device and method for measuring emission time delay during irradiation of targeted samples utilizing variable phase tracking

机译:利用可变相位​​跟踪测量目标样品辐照过程中发射时间延迟的传感装置和方法

摘要

An apparatus for measuring emission time delay during irradiation of targeted samples by utilizing digital signal processing to determine the emission phase shift caused by the sample is disclosed. The apparatus includes a source of electromagnetic radiation adapted to irradiate a target sample. A mechanism generates first and second digital input signals of known frequencies with a known phase relationship, and a device then converts the first and second digital input signals to analog sinusoidal signals. An element is provided to direct the first input signal to the electromagnetic radiation source to modulate the source by the frequency thereof to irradiate the target sample and generate a target sample emission. A device detects the target sample emission and produces a corresponding first output signal having a phase shift relative to the phase of the first input signal, the phase shift being caused by the irradiation time delay in the sample. A member produces a known phase shift in the second input signal to create a second output signal. A mechanism is then provided for converting each of the first and second analog output signals to digital signals. A mixer receives the first and second digital output signals and compares the signal phase relationship therebetween to produce a signal indicative of the change in phase relationship between the first and second output signals caused by the target sample emission. Finally, a feedback arrangement alters the phase of the second input signal based on the mixer signal to ultimately place the first and second output signals in quadrature. Mechanisms for enhancing this phase comparison and adjustment technique are also disclosed.
机译:公开了一种用于通过利用数字信号处理来确定由样品引起的发射相移来测量目标样品的照射期间的发射时间延迟的设备。该设备包括电磁辐射源,其适合于辐照目标样品。一种机制生成具有已知相位关系的已知频率的第一和第二数字输入信号,然后设备将第一和第二数字输入信号转换为模拟正弦信号。提供一种元件以将第一输入信号引导至电磁辐射源,以通过其频率来调制源,以照射目标样本并产生目标样本发射。装置检测目标样品发射并产生相对于第一输入信号的相位具有相移的相应的第一输出信号,该相移是由样品中的照射时间延迟引起的。成员在第二输入信号中产生已知的相移以创建第二输出信号。然后提供一种用于将第一和第二模拟输出信号中的每一个转换为数字信号的机制。混频器接收第一数字输出信号和第二数字输出信号,并且比较它们之间的信号相位关系,以产生指示由目标样本发射引起的第一输出信号和第二输出信号之间的相位关系变化的信号。最终,反馈装置基于混频器信号改变第二输入信号的相位,以最终将第一和第二输出信号正交。还公开了用于增强该相位比较和调整技术的机制。

著录项

  • 公开/公告号US7084409B1

    专利类型

  • 公开/公告日2006-08-01

    原文格式PDF

  • 申请/专利权人 J. D. SHELDON DANIELSON;

    申请/专利号US20000642596

  • 发明设计人 J. D. SHELDON DANIELSON;

    申请日2000-08-22

  • 分类号G01N21/64;

  • 国家 US

  • 入库时间 2022-08-21 21:43:00

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