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Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types
Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types
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机译:用于同时图案化不同特征类型的半导体制造分辨率增强系统和方法
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摘要
A method and system of making a mask with a transparent substrate thereon is provided. A first resolution enhancement structure is formed on the first portion of the transparent substrate. A second resolution enhancement structure is formed on a second portion of the transparent substrate, with the second resolution enhancement structure different from the first resolution enhancement structure.
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