首页> 外国专利> METHOD FOR CULTIVATION OF MULTILAYERED SEMI-CONDUCTOR HETEROSTRUCTURES BY THE METHOD OF LIQUID EPITAXIA OF COMBINATIONS OF amp;ldquo;UNLIMITEDamp;rdquo; AND amp;ldquo;LIMITEDamp;rdquo; SOLUTION-FLUX VOLUMES

METHOD FOR CULTIVATION OF MULTILAYERED SEMI-CONDUCTOR HETEROSTRUCTURES BY THE METHOD OF LIQUID EPITAXIA OF COMBINATIONS OF amp;ldquo;UNLIMITEDamp;rdquo; AND amp;ldquo;LIMITEDamp;rdquo; SOLUTION-FLUX VOLUMES

机译:通过“无限”组合的液体表观方法培养多层半导体异质结构的方法并且" LIMITED”溶液通量

摘要

A method provides using the solution-flux containing donor and acceptor impurities, and effecting sharp change of flux volume, available on a substrate with grown up first epitaxial p-(or n-) layer, thus, after receiving the first epitaxial layer from “unlimited” volume p-(or n-) of the solution-flux cultivation of active area during certain time is effected by restriction of volume of the first p-(or n-) solution-flux, which is characterized by a gradient of concentration of the basic components, after which on this layer of the limited volume the oncome of “unlimited” volume n-(or p-) solution-flux is effected.
机译:一种方法提供了使用含有供体和受体杂质的溶液助焊剂,并实现助焊剂体积的急剧变化,该方法在具有长成的第一外延p-(或n-)层的衬底上可用,因此,从“ ldquo ;无限一定时间内溶液-溶液培养活性区的体积p-(或n-)受第一溶液p-(或n-)溶液通量的限制,其特征在于溶液浓度的梯度。基本组件,然后在数量有限的这一层上出现“无限”的情况。产生体积为n-(或p-)的溶液通量。

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