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Nanotechnology for obtaining nanostructurized materials and nanocomposites (variants)

机译:获得纳米结构材料和纳米复合材料(变体)的纳米技术

摘要

The invention relates to the electronics, in particular to the nanotechnologies for obtaining nanostructurized materials and nanocomposites.The nanotechnology for obtaining nanostructurized materials and nanocomposites, according to the first variant, includes deposition of the chemical components onto a substrate in the presence of ultra-violet rays. Then, it is carried out the rapid photothermal processing of the obtained materials in vacuum or in the air, or in the gas chamber, for example, with oxygen.The nanotechnology for obtaining nanocomposites, according to the second variant, includes deposition of the chemical components onto a substrate in the presence of ultra-violet rays, and simultaneously with deposition of the chemical components it is carried out doping of the obtained materials with at least one donor or acceptor impurity. Then it is carried out the rapid photothermal processing of the obtained materials in vacuum or in the air, or in the gas chamber, for example, with oxygen.The nanotechnology for obtaining nanostructurized materials and nanocomposites, according to the third variant, includes deposition of the chemical components onto a substrate in the presence of ultra-violet rays, then it is carried out doping of the obtained materials with at least one donor or acceptor impurity and simultaneously with doping it is carried out the rapid photothermal processing of the obtained materials in vacuum or in the air, or in the gas chamber, for example, with oxygen.The nanotechnology for obtaining nanostructurized materials and nanocomposites, according to the fourth variant, includes deposition of the chemical components onto a substrate in the presence of ultra-violet rays, then it is carried out doping of the obtained materials with at least one donor or acceptor impurity. The impurity concentration being maximum possible for the obtained material. The subsequent rapid prhotothermal processing of the obtained materials is carried out in conditions of bringing down from the dopping temperature up to the ambient temperature in vacuum or in the air, or in the gas chamber, for example, with oxygen.
机译:技术领域本发明涉及电子学,尤其涉及用于获得纳米结构化材料和纳米复合材料的纳米技术。根据第一变体,用于获得纳米结构化材料和纳米复合材料的纳米技术包括在紫外线的存在下将化学成分沉积到基底上。射线。然后,在真空中或在空气中或在气室中,例如用氧气对所得材料进行快速光热处理。根据第二种变体,用于获得纳米复合材料的纳米技术包括化学物质的沉积。在紫外线的存在下,将金属组分掺杂到基材上,并在沉积化学组分的同时,用至少一种施主或受主杂质掺杂获得的材料。然后,在真空中,空气中或在气室中,例如用氧气对所得材料进行快速光热处理。根据第三种变体,用于获得纳米结构材料和纳米复合材料的纳米技术包括沉积将化学成分在紫外线存在下沉积到基材上,然后用至少一种施主或受主杂质对获得的材料进行掺杂,并在掺杂的同时对获得的材料进行快速光热处理。根据第四变体,用于获得纳米结构材料和纳米复合物的纳米技术包括在紫外线的存在下将化学成分沉积到基底上。然后,用至少一种施主或受主杂质对获得的材料进行掺杂。对于所获得的材料,杂质浓度是最大可能的。在真空或在空气中或在气室中,例如用氧气,从掺杂温度降低到环境温度的条件下,对所得材料进行随后的快速光热加工。

著录项

  • 公开/公告号MD2859C2

    专利类型

  • 公开/公告日2006-07-31

    原文格式PDF

  • 申请/专利权人 ŞIŞIANU SERGIU;

    申请/专利号MD20040000198

  • 申请日2004-08-12

  • 分类号B82B3/00;

  • 国家 MD

  • 入库时间 2022-08-21 21:38:37

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