首页> 外国专利> Continuous process for cleaning metal strip by etching in a tank of specific width and length and including a backwash device with avoidance of unequal distribution of the treatment liquid in the tank

Continuous process for cleaning metal strip by etching in a tank of specific width and length and including a backwash device with avoidance of unequal distribution of the treatment liquid in the tank

机译:通过在具有特定宽度和长度的槽中进行蚀刻来清洁金属带的连续工艺,该工艺包括反冲洗装置,以避免处理液在槽中分布不均

摘要

Continuous process for surface treatment, preferably cleaning, of a metal strip by means of a treatment liquid, especially an etching liquid where the metal strip is traversed horizontally through a tank, especially a flat etching tank of specific width and length, the tank containing a device for backwashing of the treatment liquid. In the region of the backwash device part of the treatment liquid is passed from the center of the tank into the side region (sic). An independent claim is included for a surface treatment device as described above.
机译:通过处理液,特别是蚀刻液对金属条进行表面处理的连续过程,最好是清洗,在该蚀刻液中,将金属条水平移动通过一个槽,特别是具有特定宽度和长度的扁平蚀刻槽,该槽包含一个用于反冲洗处理液的装置。在回洗装置的区域中,一部分处理液从罐的中心进入侧面区域(原文如此)。如上所述的表面处理装置包括独立权利要求。

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