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Method for producing optically transparent regions in a silicon substrate
Method for producing optically transparent regions in a silicon substrate
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机译:在硅衬底中产生光学透明区域的方法
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摘要
The invention relates to a simple and cost-effective method for producing optically transparent regions (5, 6) in a silicon substrate (1) with which the optically transparent regions can be realized with any thickness and can be provided above a cavity located in the silicon substrate. To this end, at least one defined region (5, 6) of the silicon substrate (1) is firstly etched whereby rendering it porous. Afterwards, the defined porous region (5, 6) of the silicon substrate (1) is oxidized.
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