首页> 外国专利> CHEMICAL PROCESSING USING NON-THERMAL DISCHARGE PLASMA

CHEMICAL PROCESSING USING NON-THERMAL DISCHARGE PLASMA

机译:使用非热放电等离子体进行化学处理

摘要

A method for activating chemical reactions using non-thermal capillary discharge plasma (NT-CDP) unit or a non-thermal slot discharge plasma (NT-SPD) unit (collectively referred to as "NT-CDP/SDP"). The NT-CDP/SDP unit includes a first electrode disposed between two dielectric layers (8 and 9), wherein the first electrode and dielectric layers having at least one opening (e.g., capillary or a slot) defined therethrough. A dielectric sleeve (3) inserted into the opening, and at least one second electrode (2) (e.g., in the shape of a pin, ring, metal wire, or tapered metal blade) is disposed in fluid communication with an associated opening. A non-thermal plasma discharge is emitted from the opening when a voltage differential is applied between the first and a second electrodes. Chemical feedstock to be treated is then exposed to the non-thermal plasma. This processing is suited for the following exemplary chemical reactions as (i) partial oxidation of hydrocarbon feedstock to produce fictionalized organic compounds; (ii) chemical stabilization of a polymer fiber (e.g., PAN fiber precursor in carbon fiber production; (iii) pre-reforming of higher chain length petroleum hydrocarbons to generate a feedstock suitable for reforming; (iv) natural gas reforming in a chemically reducingatmosphere (e.g., ammonia or urea) to produce carbon monoxide andhydrogen gas; or (v) plasma enhanced water gas shifting.
机译:一种使用非热毛细管放电等离子体(NT-CDP)单元或非热缝隙放电等离子体(NT-SPD)单元(统称为“ NT-CDP / SDP”)激活化学反应的方法。 NT-CDP / SDP单元包括设置在两个介电层(8和9)之间的第一电极,其中第一电极和介电层具有从中限定出的至少一个开口(例如,毛细管或狭缝)。介电套筒(3)插入到开口中,并且至少一个第二电极(2)(例如,以销,环,金属线或锥形金属刀片的形状)设置成与相关的开口流体连通。当在第一和第二电极之间施加电压差时,从开口发出非热等离子体放电。然后将要处理的化学原料暴露于非热等离子体中。该方法适合于以下示例性化学反应,例如:(i)烃原料的部分氧化以产生虚构的有机化合物; (ii)聚合物纤维(例如碳纤维生产中的PAN纤维前体)的化学稳定化;(iii)较高链长的石油烃的预重整以生成适合于重整的原料;(iv)在化学还原性气氛中进行天然气重整(例如氨或尿素)以产生一氧化碳和氢气;或(v)等离子体增强的水煤气转换。

著录项

  • 公开/公告号EP1472179A4

    专利类型

  • 公开/公告日2006-05-17

    原文格式PDF

  • 申请/专利权人 PLASMASOL CORPORATION;

    申请/专利号EP20020802757

  • 申请日2002-08-02

  • 分类号B01J19/08;C01B3/12;C01B3/14;C01B3/24;C01B3/34;C01B3/36;C01B32/40;C10G27/04;C10G32/02;C10G35/16;D06M10/02;H01M8/06;

  • 国家 EP

  • 入库时间 2022-08-21 21:30:12

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号