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METHOD OF MANUFACTURING VACUUM PLASMA TREATED WORKPIECES AND SYSTEM FOR VACUUM PLASMA TREATING WORKPIECES

机译:制造真空等离子体处理过的工件的方法和系统

摘要

For manufacturing a vacuum plasma treated workpiece, a workpiece to be treated is introduced into vacuum chamber (1). In the vacuum chamber (1) there is thereby established a plasma discharge at the first frequency (f1) which is at least in the Hf-frequency range. After removing the now treated workpiece from the vacuum chamber (1), the latter is cleaned, thereby establishing now a plasma discharge at a second frequency (f2) which is higher than the addressed first frequency (f1).
机译:为了制造经真空等离子体处理的工件,将要处理的工件引入真空室(1)。从而在真空室(1)中建立了至少在Hf频率范围内的第一频率(f1)的等离子体放电。从真空室(1)中取出已处理的工件后,对其进行清洁,从而在第二频率(f2)处建立等离子体放电,该频率高于所确定的第一频率(f1)。

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