AN APPATURAS FOR OVERLAY MEASUREMENT ADDED FUCTION FOR FOCUS INSPECTION AND METHOD FOR OVERLAY MEASUREMENT

摘要

overlay , the overlay measurement apparatus and measurement method using the same are provided. Overlay measurement device and measuring the overlay method , a photoresist pattern image for extracting an image of a test wafer and a photoresist pattern image of the reference wafer extractor , a photoresist pattern of the photoresist pattern of the reference image and a test wafer wafer extracted from the image extraction unit by comparing the image includes an overlay measurement of the photoresist pattern image of a photoresist pattern with the image of the test wafer and a reference wafer comparison judgment unit for judging whether the same measured overlay of the same test wafer .