APPARATUS FOR REMOVING BUBBLES AND PREVENTING BUBBLES' GROWING IN PHOTO RESIST

摘要

bubble removal device for removing air bubbles mixed into the photoresist to be sprayed onto the surface of a semiconductor wafer is disclosed. Such a bubble removal device is a vibration element, the energy being supplied by the vibration device for supplying energy to the bubble IT IS mounted in the buffer tank for supplying the bubbles into the photoresist receives supply feed line photoresist photoresist The growth in the drain portion for discharging the bubbles accumulated in the upper part of the buffer tank to the outside if it is stored in the upper portion of the buffer tank, IT IS located outside the supply line of the photoresist in the photoresist from entering the supply line picture By adjusting the temperature of the resist and a portion for preventing bubble growth to prevent the growth of air bubbles are mixed into the photoresist. Thus, the present invention is to remove air bubbles and bubble growth by providing a protection device in the photoresist, preferably the photoresist coating through the bubble removal and prevent bubble growth in the photoresist, and has the effect of increasing the yield of the semiconductor device.