Semiconductor device having measuring pattern to improve measuring reliability and Method of measuring semiconductor device using the measuring pattern

摘要

can improve the pattern for measurement to improve the reliability of the measurement in a semiconductor device having a pattern for measurement and a measuring method of a semiconductor device using the same are disclosed. A semiconductor device comprising a pattern for measurement in accordance with the present invention, the semiconductor substrate including a semiconductor integrated circuit chip region and the chip is surrounded by a region formed a scribe area; The scribe is formed in the form of an empty space on the surface of the semiconductor substrate in a region, so that the measuring beam of the measuring equipment may include a beam area that is projected pattern for measurement has a constant surface area; And the inside of the pattern for the measurement, the decrease of the surface area of the empty space of the pattern for measurement, for example, the ratio of the surface area of the pile surface of the beam cross-sectional area compared to the dummy pattern region so that the pattern is 5% to 15% includes.