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Washing Methods based on pulse laser-induced shock wave and evaporation of liquid film and Apparatus thereof

机译:基于脉冲激光引起的冲击波和液膜蒸发的洗涤方法及其装置

摘要

The present invention relates to a method of removing impurities attached to the surface of the water washing , the cleaning of water applying a liquid film ; Washing the laser pulses pass through the at least one optical focusing at a predetermined distance away from the water (focusing) and generates a plasma to produce a shock wave ; Steps to vaporize the liquid film by irradiation ( ) laser for cleaning the water surface coated with the liquid film ; Synchronizing the time of the shock wave evaporates the liquid film on time and the washing water which reaches the impurities take place ; And , time to reach this stage for removing impurities in sync evaporation pressure and shock ; made , including
机译:本发明涉及一种去除附着在水洗表面的杂质的方法,用水液膜清洗;冲洗激光脉冲通过至少一个光学聚焦,使其与水相距预定距离(聚焦),并产生等离子体以产生冲击波;通过辐照汽化液膜的步骤()激光以清洁涂有液膜的水表面;与冲击波时间同步使液膜准时蒸发,到达杂质的洗涤水发生;并且,在同步蒸发压力和冲击下达到去除杂质的时间;制造,包括

著录项

  • 公开/公告号KR100589673B1

    专利类型

  • 公开/公告日2006-06-19

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20040020662

  • 发明设计人 김동식;임현규;장덕석;

    申请日2004-03-26

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:36

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