METHOD FOR MASKING A RECESS IN A STRUCTURE WITH A LARGE ASPECT RATIO

摘要

This specification has been selective masking method is to start. Filler is applied on the structure , the filler , as a function of the aspect ratio of the structure , when a large aspect ratio is applied to the structure to form the cavity . The filling layer is removed from said cavity , wherein the filling material is completely removed from the recessed cavity is formed by etching , regions are to be selectively exposed .