METHOD FOR PRODUCING ORGANIC THIN-FILM DEVICE BY USE OF FACING-TARGETS-TYPE SPUTTERING APPARATUS

摘要

A method for the surface without causing any damage to the organic layer by a sputtering method performed in a low discharge voltage and low gas pressure on the functional organic layer formed of an organic compound forming a thin film layer, such as a metal film or a transparent conductive film. Film layers are formed to a predetermined pair of a distance facing each other of the target, the opposed target type sputtering apparatus including a magnetic field generating means which is installed on the side of the electron reflection electrode, and wherein each target is installed in the vicinity of each target. The magnetic field generation means generates a magnetic field which extends not only have a portion parallel to the target surface in the vicinity of each of the target peripheral edge portion to the remaining target at a target so as to surround the constraining space. If the alternating current power source including the DC component and the high frequency component is a sputtering target facing the power supply to the expression sputtering apparatus, the thin film layer can be formed at low gas pressure and low discharge voltage. ; The organic thin film elements, EL elements, the target, facing target sputtering device, the functional organic layer, an electron reflection electrode