METHOD AND SYSTEM FOR DYNAMIC MODELING AND RECIPE OPTIMIZATION OF SEMICONDUCTOR ETCH PROCESSES

摘要

A method and system for creating dynamic models of etch processes in semiconductor manufacturing is disclosed. In one embodiment, a method includes modeling an etch process used to build the dynamic process model in semiconductor manufacturing. The dynamic process model is used to determine the input value to produce a desired output value. Process recipe is optimized for the etch process with the input values. ; Etching step, the dynamic process model, parameters, process recipe