Photolithographic photomask production is such that the temperature used in solvent removal and/or in heating immediately before development is at 50-90degreesC for 25-35 seconds

摘要

Photolithographic production of a photomask by the standard steps of coating the substrate with a photolacquer, heating for solvent removal, illumination, heating and finally developing with a basic medium is such that the temperature used in the solvent removal and/or in the heating immediately preceding development is at 50-90[deg]C for 25-35 seconds.