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Assembly to focus e.g. a light bundle, for optical lithography and the like, has an evanescent wave generator and amplifier for the seed evanescent fields to give a focus spot
Assembly to focus e.g. a light bundle, for optical lithography and the like, has an evanescent wave generator and amplifier for the seed evanescent fields to give a focus spot
The assembly to focus (S) electromagnetic rays e.g. a light bundle (LB) below the diffraction threshold as seed evanescent fields, has an evanescent wave generator (EWE) and diaphragm (B) with an amplifier (EWV) to amplify the seed evanescent waves in close spatial proximity to their point of origin at the EWE. At the same time, the phases of the amplified evanescent fields are matched. The EWE is a semiconductor absorber which can be saturated.
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