首页> 外国专利> Granulate formation with a residual moisture of less than 1wt, comprises underwater or water ring granulation of a polymer melt and filler mixture

Granulate formation with a residual moisture of less than 1wt, comprises underwater or water ring granulation of a polymer melt and filler mixture

机译:残留水分小于1wt%的颗粒形成,包括聚合物熔体和填料混合物的水下或水环造粒

摘要

A process for producing a granulate with a residual moisture of less than 1wt%, comprises underwater or water ring granulation of a mixture of a polymer melt and a filler. The thermoplastic polymer melting point is 140-340oC. Process water from the underwater granulate (1) or the water ring granulator is applied to a sieve (2), and the granulate temperature is at least 120oC. The water vaporises until the required residual moisture level is reached. The predetermined residual moisture is less than 0.5wt%. The thermoplastic polymer is chosen from polyalkyleneterephthalate, polyamide, polysulphone or polyoxymethylene.
机译:生产残余水分小于1wt%的颗粒的方法包括将聚合物熔体和填料的混合物在水下或水环中制粒。热塑性聚合物的熔点为140-340℃。将来自水下颗粒(1)或水环造粒机的工艺水加到筛子(2)上,颗粒温度至少为120°C。水蒸发直到达到所需的残留水分水平。预定的残留水分小于0.5wt%。热塑性聚合物选自聚对苯二甲酸亚烷基酯,聚酰胺,聚砜或聚甲醛。

著录项

  • 公开/公告号DE102004052387A1

    专利类型

  • 公开/公告日2006-05-04

    原文格式PDF

  • 申请/专利权人 BASF AG;

    申请/专利号DE20041052387

  • 发明设计人 ERFINDER WIRD SPÄTER GENANNT WERDEN;

    申请日2004-10-28

  • 分类号B29B9/06;B01J2/20;B29B9/16;B29B13/06;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:40

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