首页> 外国专利> Apparatus for reacting solid in lumps with gas, especially for producing chlorosilanes from silicon and hydrogen chloride, has secondary reaction zone on supporting grating(s) below grating of main reaction zone

Apparatus for reacting solid in lumps with gas, especially for producing chlorosilanes from silicon and hydrogen chloride, has secondary reaction zone on supporting grating(s) below grating of main reaction zone

机译:用于使团块中的固体与气体反应的设备,特别是用于由硅和氯化氢生产氯硅烷的设备,在主反应区的格栅下方的支撑格栅上具有次级反应区

摘要

Apparatus for reacting solids in lumps with a gas has secondary reaction zone, in the form of other supporting grating(s), below the supporting grating of the main reaction zone. An independent claim is also included for a process for reacting silicon metal with hydrogen chloride gas in such a fixed-bed reactor.
机译:用于使团块中的固体与气体反应的设备具有在主反应区的支撑栅下方的,以其他支撑栅形式的副反应区。还涉及在这种固定床反应器中使硅金属与氯化氢气体反应的方法的独立权利要求。

著录项

  • 公开/公告号DE102004059191A1

    专利类型

  • 公开/公告日2006-06-22

    原文格式PDF

  • 申请/专利权人 DEGUSSA AG;

    申请/专利号DE20041059191

  • 发明设计人 KESPER BERNT;

    申请日2004-12-09

  • 分类号C01B33/107;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:35

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